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Transient behavior of flat-band voltage during hydrogen and deuterium adsorption on Pd-gate MOS structures

Identifieur interne : 002421 ( Main/Exploration ); précédent : 002420; suivant : 002422

Transient behavior of flat-band voltage during hydrogen and deuterium adsorption on Pd-gate MOS structures

Auteurs : A. Nannini [Italie] ; P. E. Bagnoli [Italie] ; A. Diligenti [Italie] ; V. Ciuti [Italie]

Source :

RBID : ISTEX:315D3319223CF50B26C1B7C62966516D4E6214ED

English descriptors

Abstract

Abstract: The flat-band voltage of PdSi3N4SiO2Si MOS structures has been measured at room temperature as a function of the time after the exposure of the devices to an H2N2 (D2N2) atmosphere; the hydrogen (deuterium) partial pressure was in the range 5–60 Pa. The experimental flat-band transients well agree with the analytical ones obtained from an extension to the transitory case of the induced dipole model. This fact confirms the validity of the model and allows us to investigate the behaviour of the transient parameters as a function of the H2 (D2) partial pressure.

Url:
DOI: 10.1016/0038-1101(85)90077-2


Affiliations:


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Le document en format XML

<record>
<TEI wicri:istexFullTextTei="biblStruct">
<teiHeader>
<fileDesc>
<titleStmt>
<title>Transient behavior of flat-band voltage during hydrogen and deuterium adsorption on Pd-gate MOS structures</title>
<author>
<name sortKey="Nannini, A" sort="Nannini, A" uniqKey="Nannini A" first="A." last="Nannini">A. Nannini</name>
</author>
<author>
<name sortKey="Bagnoli, P E" sort="Bagnoli, P E" uniqKey="Bagnoli P" first="P. E." last="Bagnoli">P. E. Bagnoli</name>
</author>
<author>
<name sortKey="Diligenti, A" sort="Diligenti, A" uniqKey="Diligenti A" first="A." last="Diligenti">A. Diligenti</name>
</author>
<author>
<name sortKey="Ciuti, V" sort="Ciuti, V" uniqKey="Ciuti V" first="V." last="Ciuti">V. Ciuti</name>
</author>
</titleStmt>
<publicationStmt>
<idno type="wicri:source">ISTEX</idno>
<idno type="RBID">ISTEX:315D3319223CF50B26C1B7C62966516D4E6214ED</idno>
<date when="1985" year="1985">1985</date>
<idno type="doi">10.1016/0038-1101(85)90077-2</idno>
<idno type="url">https://api.istex.fr/ark:/67375/6H6-QFRQFN6L-R/fulltext.pdf</idno>
<idno type="wicri:Area/Istex/Corpus">000F12</idno>
<idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">000F12</idno>
<idno type="wicri:Area/Istex/Curation">000F12</idno>
<idno type="wicri:Area/Istex/Checkpoint">001103</idno>
<idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Checkpoint">001103</idno>
<idno type="wicri:doubleKey">0038-1101:1985:Nannini A:transient:behavior:of</idno>
<idno type="wicri:Area/Main/Merge">002542</idno>
<idno type="wicri:Area/Main/Curation">002421</idno>
<idno type="wicri:Area/Main/Exploration">002421</idno>
</publicationStmt>
<sourceDesc>
<biblStruct>
<analytic>
<title level="a">Transient behavior of flat-band voltage during hydrogen and deuterium adsorption on Pd-gate MOS structures</title>
<author>
<name sortKey="Nannini, A" sort="Nannini, A" uniqKey="Nannini A" first="A." last="Nannini">A. Nannini</name>
<affiliation wicri:level="4">
<country xml:lang="fr">Italie</country>
<wicri:regionArea>Istituto di Elettronica e Telecomunicazioni, Facoltà di Ingegneria, Università di Pisa, Via Diotisalvi 2, 56100 Pisa</wicri:regionArea>
<placeName>
<settlement type="city">Pise</settlement>
<region nuts="2">Toscane</region>
</placeName>
<orgName type="university">Université de Pise</orgName>
<placeName>
<settlement type="city">Pise</settlement>
<region type="region" nuts="2">Toscane</region>
</placeName>
</affiliation>
</author>
<author>
<name sortKey="Bagnoli, P E" sort="Bagnoli, P E" uniqKey="Bagnoli P" first="P. E." last="Bagnoli">P. E. Bagnoli</name>
<affiliation wicri:level="4">
<country xml:lang="fr">Italie</country>
<wicri:regionArea>Istituto di Elettronica e Telecomunicazioni, Facoltà di Ingegneria, Università di Pisa, Via Diotisalvi 2, 56100 Pisa</wicri:regionArea>
<placeName>
<settlement type="city">Pise</settlement>
<region nuts="2">Toscane</region>
</placeName>
<orgName type="university">Université de Pise</orgName>
<placeName>
<settlement type="city">Pise</settlement>
<region type="region" nuts="2">Toscane</region>
</placeName>
</affiliation>
</author>
<author>
<name sortKey="Diligenti, A" sort="Diligenti, A" uniqKey="Diligenti A" first="A." last="Diligenti">A. Diligenti</name>
<affiliation wicri:level="4">
<country xml:lang="fr">Italie</country>
<wicri:regionArea>Istituto di Elettronica e Telecomunicazioni, Facoltà di Ingegneria, Università di Pisa, Via Diotisalvi 2, 56100 Pisa</wicri:regionArea>
<placeName>
<settlement type="city">Pise</settlement>
<region nuts="2">Toscane</region>
</placeName>
<orgName type="university">Université de Pise</orgName>
<placeName>
<settlement type="city">Pise</settlement>
<region type="region" nuts="2">Toscane</region>
</placeName>
</affiliation>
</author>
<author>
<name sortKey="Ciuti, V" sort="Ciuti, V" uniqKey="Ciuti V" first="V." last="Ciuti">V. Ciuti</name>
<affiliation wicri:level="4">
<country xml:lang="fr">Italie</country>
<wicri:regionArea>Istituto di Elettronica e Telecomunicazioni, Facoltà di Ingegneria, Università di Pisa, Via Diotisalvi 2, 56100 Pisa</wicri:regionArea>
<placeName>
<settlement type="city">Pise</settlement>
<region nuts="2">Toscane</region>
</placeName>
<orgName type="university">Université de Pise</orgName>
<placeName>
<settlement type="city">Pise</settlement>
<region type="region" nuts="2">Toscane</region>
</placeName>
</affiliation>
</author>
</analytic>
<monogr></monogr>
<series>
<title level="j">Solid State Electronics</title>
<title level="j" type="abbrev">SSE</title>
<idno type="ISSN">0038-1101</idno>
<imprint>
<publisher>ELSEVIER</publisher>
<date type="published" when="1985">1985</date>
<biblScope unit="volume">28</biblScope>
<biblScope unit="issue">9</biblScope>
<biblScope unit="page" from="867">867</biblScope>
<biblScope unit="page" to="873">873</biblScope>
</imprint>
<idno type="ISSN">0038-1101</idno>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt>
<idno type="ISSN">0038-1101</idno>
</seriesStmt>
</fileDesc>
<profileDesc>
<textClass>
<keywords scheme="Teeft" xml:lang="en">
<term>Adsorption</term>
<term>Continuous line</term>
<term>Desorption process</term>
<term>Equilibrium value</term>
<term>Experimental curve</term>
<term>Experimental results</term>
<term>Free metal surface</term>
<term>Free surface</term>
<term>Hydrogen adsorption</term>
<term>Hydrogen atom</term>
<term>Partial pressure</term>
<term>Partial pressures</term>
<term>Room atmosphere</term>
<term>Room temperature</term>
<term>Standard deviation</term>
<term>Straight line</term>
<term>Stright line</term>
<term>Test chamber</term>
<term>Transient</term>
<term>Transient parameters</term>
</keywords>
</textClass>
<langUsage>
<language ident="en">en</language>
</langUsage>
</profileDesc>
</teiHeader>
<front>
<div type="abstract" xml:lang="en">Abstract: The flat-band voltage of PdSi3N4SiO2Si MOS structures has been measured at room temperature as a function of the time after the exposure of the devices to an H2N2 (D2N2) atmosphere; the hydrogen (deuterium) partial pressure was in the range 5–60 Pa. The experimental flat-band transients well agree with the analytical ones obtained from an extension to the transitory case of the induced dipole model. This fact confirms the validity of the model and allows us to investigate the behaviour of the transient parameters as a function of the H2 (D2) partial pressure.</div>
</front>
</TEI>
<affiliations>
<list>
<country>
<li>Italie</li>
</country>
<region>
<li>Toscane</li>
</region>
<settlement>
<li>Pise</li>
</settlement>
<orgName>
<li>Université de Pise</li>
</orgName>
</list>
<tree>
<country name="Italie">
<region name="Toscane">
<name sortKey="Nannini, A" sort="Nannini, A" uniqKey="Nannini A" first="A." last="Nannini">A. Nannini</name>
</region>
<name sortKey="Bagnoli, P E" sort="Bagnoli, P E" uniqKey="Bagnoli P" first="P. E." last="Bagnoli">P. E. Bagnoli</name>
<name sortKey="Ciuti, V" sort="Ciuti, V" uniqKey="Ciuti V" first="V." last="Ciuti">V. Ciuti</name>
<name sortKey="Diligenti, A" sort="Diligenti, A" uniqKey="Diligenti A" first="A." last="Diligenti">A. Diligenti</name>
</country>
</tree>
</affiliations>
</record>

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